JPH0481960U - - Google Patents
Info
- Publication number
- JPH0481960U JPH0481960U JP12408790U JP12408790U JPH0481960U JP H0481960 U JPH0481960 U JP H0481960U JP 12408790 U JP12408790 U JP 12408790U JP 12408790 U JP12408790 U JP 12408790U JP H0481960 U JPH0481960 U JP H0481960U
- Authority
- JP
- Japan
- Prior art keywords
- evaporated
- electron beam
- electrons
- substance
- beam evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005566 electron beam evaporation Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 238000010894 electron beam technology Methods 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12408790U JPH0481960U (en]) | 1990-11-26 | 1990-11-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12408790U JPH0481960U (en]) | 1990-11-26 | 1990-11-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0481960U true JPH0481960U (en]) | 1992-07-16 |
Family
ID=31871757
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12408790U Pending JPH0481960U (en]) | 1990-11-26 | 1990-11-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0481960U (en]) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0867970A (ja) * | 1994-08-30 | 1996-03-12 | Nec Corp | 電子銃蒸着装置 |
| JP2011074442A (ja) * | 2009-09-30 | 2011-04-14 | Mitsubishi Electric Corp | 真空蒸着装置 |
| JP2013170272A (ja) * | 2012-02-17 | 2013-09-02 | Hitachi Zosen Corp | 電子ビーム蒸着装置 |
| WO2016052246A1 (ja) * | 2014-10-03 | 2016-04-07 | 株式会社村田製作所 | 電子ビーム蒸着装置および薄膜作製方法 |
-
1990
- 1990-11-26 JP JP12408790U patent/JPH0481960U/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0867970A (ja) * | 1994-08-30 | 1996-03-12 | Nec Corp | 電子銃蒸着装置 |
| JP2011074442A (ja) * | 2009-09-30 | 2011-04-14 | Mitsubishi Electric Corp | 真空蒸着装置 |
| JP2013170272A (ja) * | 2012-02-17 | 2013-09-02 | Hitachi Zosen Corp | 電子ビーム蒸着装置 |
| WO2016052246A1 (ja) * | 2014-10-03 | 2016-04-07 | 株式会社村田製作所 | 電子ビーム蒸着装置および薄膜作製方法 |
| JPWO2016052246A1 (ja) * | 2014-10-03 | 2017-04-27 | 株式会社村田製作所 | 電子ビーム蒸着装置および薄膜作製方法 |
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